The DC Magnetron Physical Vapor Deposition Chamber is a flexible sputter chamber that will be used to fabricate large areas of thin films and thick foils (10-200 µm) with graded chemistries across the specimen area. The thin films are tested on their substrates as done conventionally, while thick foils are removed from their substrates, annealed to grow grain sizes to 1 to 25µm and cold or warm rolled to develop a rolled texture. The system allows sputtering of up to six elements, including magnetic elements, carbides, and borides.