January 21, 2020 @ 2:30 pm - 3:30 pm
Metal Organic Cluster Photoresists for EUV Lithography using Cornell’s CNF, the original NSF nanofabrication facility
Christopher K. Ober
Francis Norwood Bard Professor of Metallurgical Engineering
Dept. of Materials Science and Engineering, Cornell University
Christopher Kemper Ober is the Francis Bard Professor of Materials Engineering at Cornell University. After several years in industry at the Xerox Research Centre of Canada, Ober arrived at Cornell in 1986. His research is focused on lithography, patterning, the biology materials interface and control of surface structure in thin films. As a reflection of his contributions to lithography, Ober in 2015 was honored with the Photopolymer Science & Technology Outstanding Contribution Award. He is the 2006 winner of the American Chemical Society Award in Applied Polymer Science, and received a Humboldt Research Prize in 2007. In 2009, Ober was named a Fellow of the American Chemical Society and was awarded the Gutenberg Research Prize by the University of Mainz. Ober served as Interim Dean of Engineering 2009 – 2010. In 2014 he was a JSPS Fellow in Japan. More recently he was elected a fellow of APS (2014) and AAAS (2015) and made a SPIE Senior Member (2018). He is currently the Director of the Cornell Nanoscale Facility.